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ISSN 2063-5346
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Characterization of ZnO doped SnO2 thin films deposited by RF magnetron sputtering

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S. R. Cynthia
» doi: 10.48047/ecb/2023.12.6.32

Abstract

High crystalline quality ZnO doped SnO2 metal oxide thin films are prepared on Fluorine doped Tin oxide (FTO) glass plates by Radio Frequency (RF) magnetron sputtering method with various sputtering power of 50 W, 100 W and 150 W. The structural, morphological, elemental and optical properties of the as-deposited films were carried out with X-ray diffraction (XRD), field emission–scanning electron microscope (FE-SEM), energy dispersive X-ray analysis (EDX) and UV-Visible-NIR spectrophotometer respectively. The XRD analysis depicted the tetragonal rutile crystalline structure of the prepared films. FE-SEM images show the variation in the surface morphology with RF sputtering power. EDX analysis confirms the purity of the films. The transmittance spectra show a decrease in transmittance of the films with increase in RF sputtering power.

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