Vanadium oxides are of novel interest for the last few decades due to their interesting electrical, structural and optical properties. The characteristic features of vanadium oxide films can be altered by doping, stress, annealing, and strain. It is also observed that characteristics of the vanadium oxide thin films depends upon various deposition conditions such as nature of substrate, gas pressure, temperature of substrate and deposition time. Therefore, it becomes an interesting area to explore the changes in the properties of vanadium oxide films grown by different techniques. In this review, we survey the fabrication techniques of VO2, V2O5 and V6O13 thin films; namely by RF sputtering, reactive rf sputtering, pulsed laser deposition, sol-gel method, e-beam evaporation, and spin coating method.